NIST seeks custom diffractometry and Fourier ptychography endstation for semiconductor metrology.
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The National Institute of Standards and Technology (NIST) seeks to procure a custom diffractometry and Fourier ptychography endstation for its CHIPS R&D program. The system must be capable of automated, high-throughput measurements of semiconductor wafers up to 300 mm, with specific technical requirements including a motorized sample stage, multiple laser wavelengths, and Fourier ptychography imaging. The contract will be awarded as a firm-fixed-price purchase order, with delivery expected within 12 months after award. This is a combined synopsis/solicitation, and quotes are due by the specified deadline.